摘要
We develop photolithography assisted chemo-mechanical etching (PLACE) and apply it for fabricating PICs on TFLN, ranging from low-loss optical delay lines and photonic neural network to EO tunable lasers and high-power waveguide amplifiers.
| 源语言 | 英语 |
|---|---|
| 主期刊名 | OECC/PSC 2025 - 30th OptoElectronics and Communications Conference/International Conference on Photonics in Switching and Computing 2025 |
| 出版商 | Institute of Electrical and Electronics Engineers Inc. |
| 版本 | 2025 |
| ISBN(电子版) | 9784885523526 |
| DOI | |
| 出版状态 | 已出版 - 2025 |
| 活动 | 30th OptoElectronics and Communications Conference and 2025 International Conference on Photonics in Switching and Computing, OECC/PSC 2025 - Sapporo, 日本 期限: 29 6月 2025 → 3 7月 2025 |
会议
| 会议 | 30th OptoElectronics and Communications Conference and 2025 International Conference on Photonics in Switching and Computing, OECC/PSC 2025 |
|---|---|
| 国家/地区 | 日本 |
| 市 | Sapporo |
| 时期 | 29/06/25 → 3/07/25 |
指纹
探究 'Wafer-Scale Waveguide Platform on Thin Film Lithium Niobate' 的科研主题。它们共同构成独一无二的指纹。引用此
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