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Wafer-scale Te thin film with high hole mobility and piezoelectric coefficients

  • Xiaochi Tai
  • , Qianru Zhao
  • , Yan Chen*
  • , Hanxue Jiao
  • , Shuaiqin Wu
  • , Dongjie Zhou
  • , Xinning Huang
  • , Ke Xiong
  • , Tie Lin
  • , Xiangjian Meng
  • , Xudong Wang
  • , Hong Shen
  • , Junhao Chu
  • , Jianlu Wang
  • *此作品的通讯作者
  • Fudan University
  • CAS - Shanghai Institute of Technical Physics

科研成果: 期刊稿件文章同行评审

摘要

p-type semiconductors are significant for integrated nanoelectronics. Tellurium (Te), a mono-elemental material, is a p-type semiconductor with high mobility. Its outstanding performance renders it widely applicable in the fields of electronics and optoelectronics. However, the wafer-scale fabrication of Te thin films is challenging. In this study, we reported an ion-bean sputtered Te thin film and investigated the effects of annealing temperatures. Annealing-induced crystallization kinetics were assessed through Raman spectroscopy, x-ray diffraction, and atomic force microscopy. After annealing, the film's conductivity increased from 10−5 to 10−4 S and mobility from 18 to 53 cm2 V−1 s−1. Dual AC resonance tracking switching spectroscopy piezoelectric force microscopy is used to investigate piezo/ferroelectric properties. The coercive voltages are −2 and 4 V respectively, and the effective piezoelectric coefficient (d33) is 40 pm/V. Butterfly and phase-switching loops demonstrate its possible ferroelectricity. The Te thin film has potential applications in optoelectronics, nonvolatile memory devices, and neuromorphic computation.

源语言英语
文章编号062103
期刊Applied Physics Letters
125
6
DOI
出版状态已出版 - 5 8月 2024
已对外发布

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