TY - CHAP
T1 - Tribological properties of tetrahedral carbon films deposited by filtered cathodic vacuum arc technique
AU - Shi, X.
AU - Tay, B. K.
AU - Flynn, D. I.
AU - Sun, Z.
PY - 1996
Y1 - 1996
N2 - Ta-C films have been deposited using FCVA technique. The hardness and Young's modulus of the films on both silicon and sapphire substrates are determined by an ultra low load depth sensing nanoindenter to examine their dependence on the carbon ion energy. An optimum ion energy around 80 to 90 eV has been found, which coincides with the energy at which the sp3 content and film density reach maximum values. At this ion energy, the hardness, modulus and critical load of a 60 nm film on sapphire exhibit maximum values of 60 GPa, 580 GPa and 7 mN, respectively, whilst the frictional coefficient shows a minimum of 0.16.
AB - Ta-C films have been deposited using FCVA technique. The hardness and Young's modulus of the films on both silicon and sapphire substrates are determined by an ultra low load depth sensing nanoindenter to examine their dependence on the carbon ion energy. An optimum ion energy around 80 to 90 eV has been found, which coincides with the energy at which the sp3 content and film density reach maximum values. At this ion energy, the hardness, modulus and critical load of a 60 nm film on sapphire exhibit maximum values of 60 GPa, 580 GPa and 7 mN, respectively, whilst the frictional coefficient shows a minimum of 0.16.
UR - https://www.scopus.com/pages/publications/0030417568
U2 - 10.1557/proc-436-293
DO - 10.1557/proc-436-293
M3 - 章节
AN - SCOPUS:0030417568
T3 - Materials Research Society Symposium - Proceedings
BT - Thin Films
T2 - Proceedings of the 1996 MRS Spring Meeting
Y2 - 8 April 1996 through 12 April 1996
ER -