摘要
Thin film field-effect phototransistors (FETs) can be developed from bandgap-tunable, solution-processed, few-layer reduced graphene oxide (FRGO) films. Large-area FRGO films with tunable bandgaps ranging from 2.2 eV to 0.5 eV can be achieved readily by solution-processing technique such as spin-coating. The electronic and optoelectronic properties of FRGO FETs are found to be closely related to their bandgap energy. The resulting phototransistor has great application potential in the field of photodetection.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 4872-4876 |
| 页数 | 5 |
| 期刊 | Advanced Materials |
| 卷 | 22 |
| 期 | 43 |
| DOI | |
| 出版状态 | 已出版 - 16 11月 2010 |
| 已对外发布 | 是 |
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