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Thin film field-effect phototransistors from bandgap-tunable, solution-processed, few-layer reduced graphene oxide films

  • Haixin Chang
  • , Zhenhua Sun
  • , Qinghong Yuan
  • , Feng Ding
  • , Xiaoming Tao
  • , Feng Yan*
  • , Zijian Zheng
  • *此作品的通讯作者
  • Hong Kong Polytechnic University

科研成果: 期刊稿件文章同行评审

摘要

Thin film field-effect phototransistors (FETs) can be developed from bandgap-tunable, solution-processed, few-layer reduced graphene oxide (FRGO) films. Large-area FRGO films with tunable bandgaps ranging from 2.2 eV to 0.5 eV can be achieved readily by solution-processing technique such as spin-coating. The electronic and optoelectronic properties of FRGO FETs are found to be closely related to their bandgap energy. The resulting phototransistor has great application potential in the field of photodetection.

源语言英语
页(从-至)4872-4876
页数5
期刊Advanced Materials
22
43
DOI
出版状态已出版 - 16 11月 2010
已对外发布

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