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The SiPM with bulk quenching resistor: Progress at NDL and applications in Raman spectroscopy

  • X. B. Hu
  • , C. Z. Hu
  • , D. P. Yin
  • , L. Y. Zhang
  • , C. N. Zhang
  • , Y. Chen
  • , G. Q. Zhang
  • , R. Yang
  • , K. Liang
  • , Yu Musienko
  • , D. J. Han*
  • *此作品的通讯作者
  • Beijing Normal University
  • Institute for Nuclear Research of the Russian Academy of Sciences

科研成果: 期刊稿件文章同行评审

摘要

The SiPMs with quenching resistors integrated into bulk epitaxial silicon have been investigated at the Novel Device Laboratory (NDL), Beijing Normal University, China. The aim is to alleviate the conflict between the high photon detection efficiency (PDE) and high APD cell density or dynamic range encountered by conventional SiPM so that this promising detector can be applied where both large dynamic range and high PDE are required simultaneously. We report herein the latest progresses on the SiPM with 10 4/mm 2 micro-cell density and 0.5 mm×0.5 mm, 1 mm×1 mm as well as 20 μm×1.8 mm effective area, which have been designed and fabricated at NDL. Application of the strip SiPM with a gated photon counting technique on the measurement of TNT Raman spectroscopy is demonstrated, and the feasibility for extending SiPMs in conjunction with Nuclear Instrumentation Modules (NIM) based electronics to the field of ultra-weak spectroscopy is verified.

源语言英语
页(从-至)29-34
页数6
期刊Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
695
DOI
出版状态已出版 - 11 12月 2012
已对外发布

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