Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films

Ya Peng Fang; Wei He; Hao Liang Liustm; Qing Feng Zhan; Hai Feng Du; Qiong Wu; Hai Tao Yang; Xiang Qun Zhang; Zhao Hua Cheng

doi:10.1063/1.3463458

Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films

Ya Peng Fang
, Wei He
, Hao Liang Liustm
, Qing Feng Zhan
, Hai Feng Du
, Qiong Wu
, Hai Tao Yang
, Xiang Qun Zhang
, Zhao Hua Cheng^*

^*此作品的通讯作者

Chinese Academy of Sciences

科研成果: 期刊稿件 › 文章 › 同行评审

24 引用（Scopus）

摘要

We report an investigation on magnetic anisotropy of Co/Si(111) films deposited at oblique incidence. An in-plane uniaxial magnetic anisotropy (UMA) with the easy axis perpendicular to the incident flux plane was observed to superimpose on sixfold magnetocrystalline anisotropy of Co films. We built a total energy model to investigate the magnetization reversal mechanism around hard axis. The simulated value of UMA is K_u =1.7× 105 erg/ cm³, which is consistent with Kshape =1.1× 10⁵ erg/ cm³ calculated from scanning tunneling microscope image. This good agreement suggests the in-plane UMA is mainly originated from the shape of the oblique deposited Co stripes.

源语言	英语
文章编号	022507
期刊	Applied Physics Letters
卷	97
期	2
DOI	https://doi.org/10.1063/1.3463458
出版状态	已出版 - 12 7月 2010
已对外发布	是

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title = "Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films",

abstract = "We report an investigation on magnetic anisotropy of Co/Si(111) films deposited at oblique incidence. An in-plane uniaxial magnetic anisotropy (UMA) with the easy axis perpendicular to the incident flux plane was observed to superimpose on sixfold magnetocrystalline anisotropy of Co films. We built a total energy model to investigate the magnetization reversal mechanism around hard axis. The simulated value of UMA is Ku =1.7× 105 erg/ cm3, which is consistent with Kshape =1.1× 105 erg/ cm3 calculated from scanning tunneling microscope image. This good agreement suggests the in-plane UMA is mainly originated from the shape of the oblique deposited Co stripes.",

author = "Fang, \{Ya Peng\} and Wei He and Liustm, \{Hao Liang\} and Zhan, \{Qing Feng\} and Du, \{Hai Feng\} and Qiong Wu and Yang, \{Hai Tao\} and Zhang, \{Xiang Qun\} and Cheng, \{Zhao Hua\}",

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month = jul,

day = "12",

doi = "10.1063/1.3463458",

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T1 - Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films

AU - Fang, Ya Peng

AU - He, Wei

AU - Liustm, Hao Liang

AU - Zhan, Qing Feng

AU - Du, Hai Feng

AU - Wu, Qiong

AU - Yang, Hai Tao

AU - Zhang, Xiang Qun

AU - Cheng, Zhao Hua

PY - 2010/7/12

Y1 - 2010/7/12

N2 - We report an investigation on magnetic anisotropy of Co/Si(111) films deposited at oblique incidence. An in-plane uniaxial magnetic anisotropy (UMA) with the easy axis perpendicular to the incident flux plane was observed to superimpose on sixfold magnetocrystalline anisotropy of Co films. We built a total energy model to investigate the magnetization reversal mechanism around hard axis. The simulated value of UMA is Ku =1.7× 105 erg/ cm3, which is consistent with Kshape =1.1× 105 erg/ cm3 calculated from scanning tunneling microscope image. This good agreement suggests the in-plane UMA is mainly originated from the shape of the oblique deposited Co stripes.

AB - We report an investigation on magnetic anisotropy of Co/Si(111) films deposited at oblique incidence. An in-plane uniaxial magnetic anisotropy (UMA) with the easy axis perpendicular to the incident flux plane was observed to superimpose on sixfold magnetocrystalline anisotropy of Co films. We built a total energy model to investigate the magnetization reversal mechanism around hard axis. The simulated value of UMA is Ku =1.7× 105 erg/ cm3, which is consistent with Kshape =1.1× 105 erg/ cm3 calculated from scanning tunneling microscope image. This good agreement suggests the in-plane UMA is mainly originated from the shape of the oblique deposited Co stripes.

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DO - 10.1063/1.3463458

M3 - 文章

AN - SCOPUS:77955149493

SN - 0003-6951

VL - 97

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 2

M1 - 022507

ER -

Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films

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