Study on the strain in a silicon microchannel plate by micro-Raman analysis

Shaohui Xu; Jiabing Fang; Dajun Wu; Chi Zhang; Yiping Zhu; Dayuan Xiong; Lianwei Wang; Pingxiong Yang; Paul K. Chu

doi:10.1088/0268-1242/31/5/055010

Study on the strain in a silicon microchannel plate by micro-Raman analysis

Shaohui Xu
, Jiabing Fang
, Dajun Wu
, Chi Zhang
, Yiping Zhu
, Dayuan Xiong
, Lianwei Wang
, Pingxiong Yang
, Paul K. Chu

物理与电子科学学院

East China Normal University
City University of Hong Kong

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

Micro-Raman analysis was used to identify the oxidation of a silicon microchannel plate (SiMCP) and it indicated that the bend phenomenon of the SiMCP was related to the release of stress and the volume expending of the silicon wall during the oxidation process.

源语言	英语
文章编号	055010
期刊	Semiconductor Science and Technology
卷	31
期	5
DOI	https://doi.org/10.1088/0268-1242/31/5/055010
出版状态	已出版 - 29 3月 2016

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10.1088/0268-1242/31/5/055010

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@article{f33a8789d55e41ea8def5a0f8960f25a,

title = "Study on the strain in a silicon microchannel plate by micro-Raman analysis",

abstract = "Micro-Raman analysis was used to identify the oxidation of a silicon microchannel plate (SiMCP) and it indicated that the bend phenomenon of the SiMCP was related to the release of stress and the volume expending of the silicon wall during the oxidation process.",

keywords = "micro-Raman, oxidation, silicon microchannel plates, stain",

author = "Shaohui Xu and Jiabing Fang and Dajun Wu and Chi Zhang and Yiping Zhu and Dayuan Xiong and Lianwei Wang and Pingxiong Yang and Chu, \{Paul K.\}",

note = "Publisher Copyright: {\textcopyright} 2016 IOP Publishing Ltd.",

year = "2016",

month = mar,

day = "29",

doi = "10.1088/0268-1242/31/5/055010",

language = "英语",

volume = "31",

journal = "Semiconductor Science and Technology",

issn = "0268-1242",

publisher = "IOP Publishing Ltd.",

number = "5",

}

TY - JOUR

T1 - Study on the strain in a silicon microchannel plate by micro-Raman analysis

AU - Xu, Shaohui

AU - Fang, Jiabing

AU - Wu, Dajun

AU - Zhang, Chi

AU - Zhu, Yiping

AU - Xiong, Dayuan

AU - Wang, Lianwei

AU - Yang, Pingxiong

AU - Chu, Paul K.

PY - 2016/3/29

Y1 - 2016/3/29

N2 - Micro-Raman analysis was used to identify the oxidation of a silicon microchannel plate (SiMCP) and it indicated that the bend phenomenon of the SiMCP was related to the release of stress and the volume expending of the silicon wall during the oxidation process.

AB - Micro-Raman analysis was used to identify the oxidation of a silicon microchannel plate (SiMCP) and it indicated that the bend phenomenon of the SiMCP was related to the release of stress and the volume expending of the silicon wall during the oxidation process.

KW - micro-Raman

KW - oxidation

KW - silicon microchannel plates

KW - stain

UR - https://www.scopus.com/pages/publications/84963795068

U2 - 10.1088/0268-1242/31/5/055010

DO - 10.1088/0268-1242/31/5/055010

M3 - 文章

AN - SCOPUS:84963795068

SN - 0268-1242

VL - 31

JO - Semiconductor Science and Technology

JF - Semiconductor Science and Technology

IS - 5

M1 - 055010

ER -

Study on the strain in a silicon microchannel plate by micro-Raman analysis

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