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Structural characterization of β-FeSi2 films on Si(100) prepared by reactive deposition solid phase epitaxy

  • Rushan Ni*
  • , Lianwei Wang
  • , Qinwo Shen
  • , Chenglu Lin
  • *此作品的通讯作者
  • CAS - Shanghai Institute of Microsystem and Information Technology

科研成果: 期刊稿件文章同行评审

摘要

Semiconducting β-FeSi2 films have been synthesized by reactive deposition solid phase epitaxy. X-ray diffraction, Rutherford backscattering spectroscopy and channeling, and transmission electron microscopy have been used to determine the microstructure. Different growth conditions have been compared.

源语言英语
页(从-至)541-545
页数5
期刊Journal of Trace and Microprobe Techniques
15
4
出版状态已出版 - 1997
已对外发布

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