摘要
Semiconducting β-FeSi2 films have been synthesized by reactive deposition solid phase epitaxy. X-ray diffraction, Rutherford backscattering spectroscopy and channeling, and transmission electron microscopy have been used to determine the microstructure. Different growth conditions have been compared.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 541-545 |
| 页数 | 5 |
| 期刊 | Journal of Trace and Microprobe Techniques |
| 卷 | 15 |
| 期 | 4 |
| 出版状态 | 已出版 - 1997 |
| 已对外发布 | 是 |
指纹
探究 'Structural characterization of β-FeSi2 films on Si(100) prepared by reactive deposition solid phase epitaxy' 的科研主题。它们共同构成独一无二的指纹。引用此
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver