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Structural and optical properties of LuFeO 3 thin films prepared on silicon (100) substrate by pulsed laser deposition

  • East China Normal University
  • Shanghai University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

The LuFeO 3 (LFO) nanocrystalline films with the average grain size of 20 nm have been grown on silicon (100) substrates by pulsed laser deposition. X-ray diffraction (XRD) analysis shows that LFO films are polycrystalline. The microstructure and surface morphology of LFO film are analyzed by Atomic force microscope (AFM) and the surface shows the film is compact. Spectroscopic ellipsometry (SE) was used to extract the optical properties of LFO films in the 1.1-3.1 eV (400-1100 nm) photon energy range at room temperature. By fitting the measured ellipsometric parameter data with a multilayer model system for the LFO thin films, the optical constants and thicknesses of the thin films have been obtained. The refractive index n and extinction coefficient k of the LFO thin films both decreases with increasing thickness.

源语言英语
主期刊名Photonics and Optolectronics Meetings (POEM) 2011
主期刊副标题Optoelectronic Devices and Integration
DOI
出版状态已出版 - 2012
活动Photonics and Optolectronics Meetings (POEM) 2011: Optoelectronic Devices and Integration - Wuhan, 中国
期限: 2 11月 20115 11月 2011

出版系列

姓名Proceedings of SPIE - The International Society for Optical Engineering
8333
ISSN(印刷版)0277-786X

会议

会议Photonics and Optolectronics Meetings (POEM) 2011: Optoelectronic Devices and Integration
国家/地区中国
Wuhan
时期2/11/115/11/11

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