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Strain Effect on Oxygen Evolution Reaction Activity of Epitaxial NdNiO 3 Thin Films

  • Le Wang
  • , Kelsey A. Stoerzinger
  • , Lei Chang
  • , Xinmao Yin
  • , Yangyang Li
  • , Chi Sin Tang
  • , Endong Jia
  • , Mark E. Bowden
  • , Zhenzhong Yang
  • , Amr Abdelsamie
  • , Lu You
  • , Rui Guo
  • , Jingsheng Chen
  • , Andrivo Rusydi
  • , Junling Wang
  • , Scott A. Chambers
  • , Yingge Du*
  • *此作品的通讯作者
  • Pacific Northwest National Laboratory
  • Oregon State University
  • National University of Singapore
  • CAS - Institute of Electrical Engineering
  • University of Chinese Academy of Sciences
  • Environmental Molecular Sciences Laboratory

科研成果: 期刊稿件文章同行评审

摘要

Epitaxial strain can cause both lattice distortion and oxygen nonstoichiometry, effects that are strongly coupled at heterojunctions of complex nickelate oxides. Here we decouple these structural and chemical effects on the oxygen evolution reaction (OER) by using a set of coherently strained epitaxial NdNiO 3 films. We show that within the regime where oxygen vacancies (V O ) are negligible, compressive strain is favorable for the OER whereas tensile strain is unfavorable; the former induces orbital splitting, resulting in a higher occupancy in the d 3z 2 âr 2 orbital and weaker Ni-O chemisorption. However, when the tensile strain is sufficiently large to promote V O formation, an increase in the OER is also observed. The partial reduction of Ni 3+ to Ni 2+ due to V O makes the e g occupancy slightly larger than unity, which is thought to account for the increased OER activity. Our work highlights that epitaxial-strain-induced lattice distortion and V O generation can be individually or collectively exploited to tune OER activity, which is important for the predictive synthesis of high-performance electrocatalysts.

源语言英语
页(从-至)12941-12947
页数7
期刊ACS Applied Materials and Interfaces
11
13
DOI
出版状态已出版 - 3 4月 2019
已对外发布

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