Single-crystalline, single-domain epitaxy of PbTiO3 thin films by metalorganic chemical vapor deposition

Yan Feng Chen; Li Sun; Tao Yu; Jian Xie Chen; Nai Ben Ming; De Sheng Ding; Lian Wei Wang

doi:10.1063/1.115261

Single-crystalline, single-domain epitaxy of PbTiO₃ thin films by metalorganic chemical vapor deposition

Yan Feng Chen^*
, Li Sun
, Tao Yu
, Jian Xie Chen
, Nai Ben Ming
, De Sheng Ding
, Lian Wei Wang

^*此作品的通讯作者

Nanjing University
Southeast University, Nanjing
CAS - Shanghai Institute of Microsystem and Information Technology

科研成果: 期刊稿件 › 文章 › 同行评审

18 引用（Scopus）

摘要

Single-crystalline and single-domain PbTiO₃ films with thickness of 3000 Å have been prepared by metalorganic chemical vapor deposition (MOCVD), using metalorganic precursors of tetra-ethyl-lead and iso-propoxide titanium. The nature of single-crystalline epitaxy and single domain of as-grown films was characterized by x-ray diffraction (XRD), synchrotron radiation (SR), and Rutherford backscattering (RBS). Using atomic force microscopy (AFM), the evidence of layer-by-layer growth was observed. The growth steps on the surface may be attributable to the formation of single-crystalline and single-domain PbTiO₃ film with 3000-Å thickness.

源语言	英语
页（从-至）	3503
页数	1
期刊	Applied Physics Letters
卷	67
DOI	https://doi.org/10.1063/1.115261
出版状态	已出版 - 1995
已对外发布	是

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title = "Single-crystalline, single-domain epitaxy of PbTiO3 thin films by metalorganic chemical vapor deposition",

abstract = "Single-crystalline and single-domain PbTiO3 films with thickness of 3000 {\AA} have been prepared by metalorganic chemical vapor deposition (MOCVD), using metalorganic precursors of tetra-ethyl-lead and iso-propoxide titanium. The nature of single-crystalline epitaxy and single domain of as-grown films was characterized by x-ray diffraction (XRD), synchrotron radiation (SR), and Rutherford backscattering (RBS). Using atomic force microscopy (AFM), the evidence of layer-by-layer growth was observed. The growth steps on the surface may be attributable to the formation of single-crystalline and single-domain PbTiO3 film with 3000-{\AA} thickness.",

author = "Chen, \{Yan Feng\} and Li Sun and Tao Yu and Chen, \{Jian Xie\} and Ming, \{Nai Ben\} and Ding, \{De Sheng\} and Wang, \{Lian Wei\}",

year = "1995",

doi = "10.1063/1.115261",

language = "英语",

volume = "67",

pages = "3503",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

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TY - JOUR

T1 - Single-crystalline, single-domain epitaxy of PbTiO3 thin films by metalorganic chemical vapor deposition

AU - Chen, Yan Feng

AU - Sun, Li

AU - Yu, Tao

AU - Chen, Jian Xie

AU - Ming, Nai Ben

AU - Ding, De Sheng

AU - Wang, Lian Wei

PY - 1995

Y1 - 1995

N2 - Single-crystalline and single-domain PbTiO3 films with thickness of 3000 Å have been prepared by metalorganic chemical vapor deposition (MOCVD), using metalorganic precursors of tetra-ethyl-lead and iso-propoxide titanium. The nature of single-crystalline epitaxy and single domain of as-grown films was characterized by x-ray diffraction (XRD), synchrotron radiation (SR), and Rutherford backscattering (RBS). Using atomic force microscopy (AFM), the evidence of layer-by-layer growth was observed. The growth steps on the surface may be attributable to the formation of single-crystalline and single-domain PbTiO3 film with 3000-Å thickness.

AB - Single-crystalline and single-domain PbTiO3 films with thickness of 3000 Å have been prepared by metalorganic chemical vapor deposition (MOCVD), using metalorganic precursors of tetra-ethyl-lead and iso-propoxide titanium. The nature of single-crystalline epitaxy and single domain of as-grown films was characterized by x-ray diffraction (XRD), synchrotron radiation (SR), and Rutherford backscattering (RBS). Using atomic force microscopy (AFM), the evidence of layer-by-layer growth was observed. The growth steps on the surface may be attributable to the formation of single-crystalline and single-domain PbTiO3 film with 3000-Å thickness.

UR - https://www.scopus.com/pages/publications/0001189646

U2 - 10.1063/1.115261

DO - 10.1063/1.115261

M3 - 文章

AN - SCOPUS:0001189646

SN - 0003-6951

VL - 67

SP - 3503

JO - Applied Physics Letters

JF - Applied Physics Letters

ER -

Single-crystalline, single-domain epitaxy of PbTiO3 thin films by metalorganic chemical vapor deposition

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Single-crystalline, single-domain epitaxy of PbTiO₃ thin films by metalorganic chemical vapor deposition