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Probing and manipulating the interfacial defects of InGaAs dual-layer metal oxides at the atomic scale

  • Xing Wu*
  • , Chen Luo
  • , Peng Hao
  • , Tao Sun
  • , Runsheng Wang
  • , Chaolun Wang
  • , Zhigao Hu
  • , Yawei Li
  • , Jian Zhang
  • , Gennadi Bersuker
  • , Litao Sun
  • , Kinleong Pey
  • *此作品的通讯作者
  • Southeast University, Nanjing
  • East China Normal University
  • Peking University
  • Aerospace Corporation
  • Singapore University of Technology and Design

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

The interface between III-V and metal-oxide-semiconductor materials plays a central role in the operation of high-speed electronic devices, such as transistors and light-emitting diodes. The design of high-performance devices requires a detailed understanding of the electronic structure at the interface. However, the relation between the interface state charges to the electrical failure, such as breakdown of the oxide in the transistor remains unknown. Herein, the defect-driven interfacial electron structure of the Ti/ZrO2/Al2O3/InGaAs system are probed and manipulated using a specifically designed in situ transmission electron microscopy experimental method. The interfacial defects induced by oxygen-atom missing is found the main reason for the device failure. This study unearths the fundamental defect-driven interfacial electric structure of III-V semiconductor materials and paves the way to future high-speed and high-reliability devices.

源语言英语
主期刊名China Semiconductor Technology International Conference 2018, CSTIC 2018
编辑Hanming Wu, Peilin Song, Qinghuang Lin, Yuchun Wang, Cor Claeys, Hsiang-Lang Lung, Ying Zhang, Steve Liang, Yiyu Shi, Ru Huang, Zhen Guo, Kafai Lai
出版商Institute of Electrical and Electronics Engineers Inc.
1-3
页数3
ISBN(电子版)9781538653081
DOI
出版状态已出版 - 29 5月 2018
活动2018 China Semiconductor Technology International Conference, CSTIC 2018 - Shanghai, 中国
期限: 11 3月 201812 3月 2018

出版系列

姓名China Semiconductor Technology International Conference 2018, CSTIC 2018

会议

会议2018 China Semiconductor Technology International Conference, CSTIC 2018
国家/地区中国
Shanghai
时期11/03/1812/03/18

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