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Preparation and properties of lanthanum strontium cobalt films on Si(1 0 0) by metallorganic chemical liquid deposition

  • G. S. Wang*
  • , Z. Q. Lai
  • , J. Yu
  • , S. L. Guo
  • , J. H. Chu
  • , G. Li
  • , Q. H. Lu
  • *此作品的通讯作者
  • CAS - Shanghai Institute of Technical Physics
  • Shanghai Jiao Tong University

科研成果: 期刊稿件文章同行评审

摘要

Lanthanum strontium cobalt La0.5Sr0.5CoO3 (LSCO) films have been grown on Si(1 0 0) substrate by metallorganic chemical liquid deposition (MOCLD) technique using lanthanum acetate, strontium acetate and cobalt acetate as the starting materials. The technique simplified the preparation of LSCO thin films by chemical solution routes. The films were crystallized by rapid thermal annealing (RTA) process. The films annealed between 600°C and 750°C are entirely in the perovskite phase and show good conductivity. The lowest resistivity (950 μΩ cm) thin films were obtained by annealing at 750°C. The size effect of sheet resistance of the LSCO films has been discussed. PbZr0.5Ti0.5O3 (PZT) films deposited onto LSCO films displayed a good P-E hysteresis characteristic.

源语言英语
页(从-至)512-516
页数5
期刊Journal of Crystal Growth
233
3
DOI
出版状态已出版 - 12月 2001
已对外发布

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