摘要
Al doped Sb 2 Te 3 material was proposed to improve the performance of phase-change memory. Crystallization temperature, activation energy, and electrical resistance of the Al doped Sb 2 Te 3 films increase markedly with the increasing of Al concentration. The additional Al-Sb and Al-Te bonds enhance the amorphous thermal stability of the material. Al 0.69 Sb 2 Te 3 material has a better data retention (10 years at 110 °C) than that of Ge 2 Sb 2 Te 5 material (10 years at 87 °C). With a 100 ns width voltage pulse, SET and RESET voltages of 1.3 and 3.3 V are achieved for the Al 0.69 Sb 2 Te 3 based device.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 10667-10670 |
| 页数 | 4 |
| 期刊 | Applied Surface Science |
| 卷 | 257 |
| 期 | 24 |
| DOI | |
| 出版状态 | 已出版 - 1 10月 2011 |
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