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Patterned uniformly orientated silicon nanocrystallite films and efficient field emission characteristics

  • Ke Yu*
  • , Ziqiang Zhu
  • , Weimin Wang
  • , Shaoqiang Chen
  • , Qiong Li
  • , Qun Chen
  • , Wei Lu
  • , Jian Zi
  • *此作品的通讯作者

科研成果: 期刊稿件文章同行评审

摘要

Patterned uniformly (100)-orientated silicon nanocrystallite (SiNC) films were fabricated based on hydrogen ion implantation technique and typical electrochemical anodic etching method. The surface morphology and microstructure characteristics of the films were characterized by scanning electron microscopy, transmission electron microscopy, X-ray diffraction, and atomic force microscopy. The efficient field emission with low turn-on field of about 3.2 V/μm at current density of 0.1 μA/cm2 was obtained. The emission current density from the SiNC films reached 1 mA/cm2 under a bias field of about 11 V/μm. The experimental results demonstrate that the SiNC films have great potential applications for flat panel displays.

源语言英语
页(从-至)555-558
页数4
期刊Solid State Communications
129
9
DOI
出版状态已出版 - 3月 2004

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