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NIR-emitting erbium/oxygen-doped silicon by self-assembled techniques

  • Huimin Wen
  • , Jiajing He
  • , Jin Hong
  • , Fangyu Yue
  • , Yaping Dan
  • Shanghai Jiao Tong University
  • East China Normal University

科研成果: 书/报告/会议事项章节 › 会议稿件 › 同行评审

摘要

Self-assembled monolayer (SAM) techniques have been developed to dope silicon surfaces with use of erbium radiation sources. After rapid thermal annealing at 1050°C, surface monolayer structure and dopant concentration distribution were characterized by X-ray photoelectron spectroscopy and secondary ion mass spectroscopy measurements, respectively. A distinctive^{4}I-{13/2}\rightarrow^{4}I-{15/2} transition of erbium ion (4f) glowing at 1.54 \mum has been observed at room temperature for these Er/O-doped Si samples. With these preliminary results, it is promising to develop room-temperature silicon-based light-emitting devices and lasers on the basis of these bottom-up SAM techniques.

源语言英语
主期刊名2019 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2019
出版商Institute of Electrical and Electronics Engineers Inc.
ISBN(电子版)9781728102863
DOI
出版状态已出版 - 6月 2019
活动2019 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2019 - Xi'an, 中国
期限: 12 6月 2019 → 14 6月 2019

丛书

姓名2019 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2019

会议

会议2019 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2019
国家/地区中国
市Xi'an
时期12/06/19 → 14/06/19

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