TY - JOUR
T1 - Multistate nonvolatile memory enabled by opto-electric manipulation based on van der Waals ferroelectric semiconductor
AU - Wang, Lu
AU - Wu, Shuaiqin
AU - Zhao, Qianru
AU - Wang, Huiting
AU - Zeng, Jinhua
AU - Diao, Zhaobiao
AU - Zhao, Dongyang
AU - Zheng, Yuqing
AU - Chen, Yan
AU - Liu, Chang
AU - Wu, Binmin
AU - Lin, Tie
AU - Shen, Hong
AU - Meng, Xiangjian
AU - Wang, Xudong
AU - Chu, Junhao
AU - Wang, Jianlu
N1 - Publisher Copyright:
© 2025 Elsevier Ltd
PY - 2025/4
Y1 - 2025/4
N2 - In the era of big data and artificial intelligence, the rising demand for data-intensive processing, alongside the need to minimize system complexity, underscores the growing importance of non-volatile memory with electro-optic capabilities. Against this backdrop, significant exploration of advanced memory architectures has been spurred. Here, we present a ferroelectric semiconductor ferroelectric field-effect transistor (FeS-FeFET) whose channel and gate dielectric are both ferroelectric materials. It establishes a dual-mode, multi-state non-volatile optoelectronic memory. Through investigation of in-plane polarization in the ferroelectric channel and out-of-plane polarization in the ferroelectric gate dielectric, the device demonstrates two-level electrical programming and erasing, along with robust optoelectronic memory characteristics. Specifically, the device exhibits four distinct resistance states under a 5 V operating voltage, with programming speeds up to 40 ns, an optical memory capacity of 7 bits, a maximum on/off current ratio of 104, and a retention time exceeding 103 s. This work presents promising advancements for future high-density, low-power technologies, with broad applications in high-density data memory and neuromorphic computing.
AB - In the era of big data and artificial intelligence, the rising demand for data-intensive processing, alongside the need to minimize system complexity, underscores the growing importance of non-volatile memory with electro-optic capabilities. Against this backdrop, significant exploration of advanced memory architectures has been spurred. Here, we present a ferroelectric semiconductor ferroelectric field-effect transistor (FeS-FeFET) whose channel and gate dielectric are both ferroelectric materials. It establishes a dual-mode, multi-state non-volatile optoelectronic memory. Through investigation of in-plane polarization in the ferroelectric channel and out-of-plane polarization in the ferroelectric gate dielectric, the device demonstrates two-level electrical programming and erasing, along with robust optoelectronic memory characteristics. Specifically, the device exhibits four distinct resistance states under a 5 V operating voltage, with programming speeds up to 40 ns, an optical memory capacity of 7 bits, a maximum on/off current ratio of 104, and a retention time exceeding 103 s. This work presents promising advancements for future high-density, low-power technologies, with broad applications in high-density data memory and neuromorphic computing.
KW - Ferroelectric materials
KW - InSe
KW - InSe
KW - Photoelectric memory
KW - Two-dimensional ferroelectric semiconductor
UR - https://www.scopus.com/pages/publications/86000318983
U2 - 10.1016/j.apmt.2025.102662
DO - 10.1016/j.apmt.2025.102662
M3 - 文章
AN - SCOPUS:86000318983
SN - 2352-9407
VL - 43
JO - Applied Materials Today
JF - Applied Materials Today
M1 - 102662
ER -