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Multistate nonvolatile memory enabled by opto-electric manipulation based on van der Waals ferroelectric semiconductor

  • Lu Wang
  • , Shuaiqin Wu
  • , Qianru Zhao
  • , Huiting Wang
  • , Jinhua Zeng
  • , Zhaobiao Diao
  • , Dongyang Zhao
  • , Yuqing Zheng
  • , Yan Chen
  • , Chang Liu
  • , Binmin Wu
  • , Tie Lin
  • , Hong Shen
  • , Xiangjian Meng
  • , Xudong Wang*
  • , Junhao Chu
  • , Jianlu Wang
  • *此作品的通讯作者
  • University of Chinese Academy of Sciences
  • CAS - Shanghai Institute of Technical Physics
  • Fudan University

科研成果: 期刊稿件文章同行评审

摘要

In the era of big data and artificial intelligence, the rising demand for data-intensive processing, alongside the need to minimize system complexity, underscores the growing importance of non-volatile memory with electro-optic capabilities. Against this backdrop, significant exploration of advanced memory architectures has been spurred. Here, we present a ferroelectric semiconductor ferroelectric field-effect transistor (FeS-FeFET) whose channel and gate dielectric are both ferroelectric materials. It establishes a dual-mode, multi-state non-volatile optoelectronic memory. Through investigation of in-plane polarization in the ferroelectric channel and out-of-plane polarization in the ferroelectric gate dielectric, the device demonstrates two-level electrical programming and erasing, along with robust optoelectronic memory characteristics. Specifically, the device exhibits four distinct resistance states under a 5 V operating voltage, with programming speeds up to 40 ns, an optical memory capacity of 7 bits, a maximum on/off current ratio of 104, and a retention time exceeding 103 s. This work presents promising advancements for future high-density, low-power technologies, with broad applications in high-density data memory and neuromorphic computing.

源语言英语
文章编号102662
期刊Applied Materials Today
43
DOI
出版状态已出版 - 4月 2025
已对外发布

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