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Modeling Stroke Mask for End-to-End Text Erasing

  • Xiangcheng Du
  • , Zhao Zhou
  • , Yingbin Zheng
  • , Tianlong Ma
  • , Xingjiao Wu
  • , Cheng Jin*
  • *此作品的通讯作者
  • Fudan University
  • Videt Lab
  • Key Laboratory of Culture & Tourism Intelligent Computing of Ministry of Culture & Tourism

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

Scene text erasing aims to wipe text regions in scene images with reasonable background. Most previous approaches employ scene text detectors to assist localization of the text regions. However, detected text boxes contain both text strokes and background clutters, and directly in-painting on the whole boxes may remain text artifacts and make regions unnatural. In this paper, we present an end-to-end network that focuses on modeling text stroke masks that provide more accurate locations to compute erased images. The network consists of two stages, i.e., a basic network with stroke generation and a refinement network with stroke awareness. The basic network predicts the text stroke masks and initial erasing results simultaneously. The refinement network receives the masks as supervision to generate natural erased results. Experiments on both synthetic and real-world scene images demonstrate the effectiveness of our framework in producing high quality erasing results.

源语言英语
主期刊名Proceedings - 2023 IEEE Winter Conference on Applications of Computer Vision, WACV 2023
出版商Institute of Electrical and Electronics Engineers Inc.
6140-6148
页数9
ISBN(电子版)9781665493468
DOI
出版状态已出版 - 2023
已对外发布
活动23rd IEEE/CVF Winter Conference on Applications of Computer Vision, WACV 2023 - Waikoloa, 美国
期限: 3 1月 20237 1月 2023

出版系列

姓名Proceedings - 2023 IEEE Winter Conference on Applications of Computer Vision, WACV 2023

会议

会议23rd IEEE/CVF Winter Conference on Applications of Computer Vision, WACV 2023
国家/地区美国
Waikoloa
时期3/01/237/01/23

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