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Modeling of Gate Tunable Synaptic Device for Neuromorphic Applications

  • Yang Shen
  • , He Tian*
  • , Yanming Liu
  • , Fan Wu
  • , Zhaoyi Yan
  • , Thomas Hirtz
  • , Xuefeng Wang
  • , Tian Ling Ren*
  • *此作品的通讯作者

科研成果: 期刊稿件文章同行评审

摘要

The emerging memories are great candidates to establish neuromorphic computing challenging non-Von Neumann architecture. Emerging non-volatile resistive random-access memory (RRAM) attracted abundant attention recently for its low power consumption and high storage density. Up to now, research regarding the tunability of the On/Off ratio and the switching window of RRAM devices remains scarce. In this work, the underlying mechanisms related to gate tunable RRAMs are investigated. The principle of such a device consists of controlling the filament evolution in the resistive layer using graphene and an electric field. A physics-based stochastic simulation was employed to reveal the mechanisms that link the filament size and the growth speed to the back-gate bias. The simulations demonstrate the influence of the negative gate voltage on the device current which in turn leads to better characteristics for neuromorphic computing applications. Moreover, a high accuracy (94.7%) neural network for handwritten character digit classification has been realized using the 1-transistor 1-memristor (1T1R) crossbar cell structure and our stochastic simulation method, which demonstrate the optimization of gate tunable synaptic device.

源语言英语
文章编号777691
期刊Frontiers in Physics
9
DOI
出版状态已出版 - 24 12月 2021
已对外发布

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