摘要
Graphene chemical vapor deposition (CVD) growth is the most studied method for graphene synthesis. It has the advantages of synthesizing very large area graphene, easy to controlling the number of layers and easy for transfer from the catalyst surface to the desired substrates. But the quality of graphene CVD samples is still not as good as those made by the mechanical peeling method. So, improving the quality of CVD synthesized graphene is the primary objective of study. To achieve this requires careful experimental design with the guidance of detailed and insightful mechanism of growth. Although a great number of experimental and theoretical efforts have been dedicated to the understanding of graphene CVD growth, our knowledge is far from sufficient to guide the experimental design. So, here we plan to briefly present the recent status of graphene CVD growth, especially the theoretical understanding on the mechanism in this chapter.
| 源语言 | 英语 |
|---|---|
| 主期刊名 | Graphene Chemistry |
| 主期刊副标题 | Theoretical Perspectives |
| 出版商 | wiley |
| 页 | 255-290 |
| 页数 | 36 |
| ISBN(电子版) | 9781118691281 |
| ISBN(印刷版) | 9781119942122 |
| DOI | |
| 出版状态 | 已出版 - 9 8月 2013 |
| 已对外发布 | 是 |
指纹
探究 'Mechanisms of Graphene Chemical Vapor Deposition (CVD) Growth' 的科研主题。它们共同构成独一无二的指纹。引用此
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