跳到主要导航 跳到搜索 跳到主要内容

Mechanism of oxidation on Si2Sb2Te5 phase change material and its application

  • Ting Zhang*
  • , Zhitang Song
  • , Yifeng Gu
  • , Yan Cheng
  • , Bo Liu
  • , Songlin Feng
  • *此作品的通讯作者
  • CAS - Shanghai Institute of Microsystem and Information Technology

科研成果: 期刊稿件文章同行评审

摘要

Uniformly oxygen doping into phase change materials (PCMs) will increase their crystallization temperatures, but natural oxidation of PCMs has an opposite effect. Mechanism of oxidation for Si2Sb2Te 5 was studied by in situ X-ray photoelectron spectroscopy, employing an oxygen content gradient sample. During an oxidation process, oxygen preferentially reacts with Si due to its smallest electronegativity value among Si, Sb, and Te elements. Models have been proposed for the different mechanisms of oxidation. O-doping into Si-Sb-Te was proposed to prepare nano-crystal PCM based on the discovering. Performance of nano-crystal material and memory device was effectively promoted.

源语言英语
文章编号020202
期刊Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
50
2
DOI
出版状态已出版 - 2月 2011
已对外发布

指纹

探究 'Mechanism of oxidation on Si2Sb2Te5 phase change material and its application' 的科研主题。它们共同构成独一无二的指纹。

引用此