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Measurement of electron affinity in boron-doped diamond from capacitance spectroscopy

  • Kun Liu*
  • , Bo Zhang
  • , Mingfang Wan
  • , J. H. Chu
  • , C. Johnston
  • , S. Roth
  • *此作品的通讯作者
  • CAS - Shanghai Institute of Technical Physics
  • Ricardo
  • Max Planck Institute for Solid State Research

科研成果: 期刊稿件文章同行评审

摘要

Boron-doped diamond film sample has been grown on (100) silicon substrate using the microwave enhanced chemical vapor deposition method. It is found that the sample has very good material qualities and an excellent (100) surface morphology. Au/diamond Schottky was fabricated on the (100) surface to study electron affinity of the diamond sample. By measuring frequency dependence capacitance-voltage spectroscopy of the Schottky sample in high vacuum and at room temperature, a very small electron affinity of about 0.025 eV and a work function of about 5.165 eV have been obtained for the (100) surface of the diamond sample supposing the diamond band gap energy is 5.5 eV.

源语言英语
页(从-至)2891-2893
页数3
期刊Applied Physics Letters
70
21
DOI
出版状态已出版 - 26 5月 1997
已对外发布

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