Manipulation of cross-linked micro/nanopatterns on ZnO by adjusting the femtosecond-laser polarizations of four-beam interference

We report the fabrication of cross-linked micro/nanopatterns on ZnO by adjusting the femtosecond-laser polarizations of four-beam interference. The micro/nanopatterns are composed of two types of patterns with vertically oriented and horizontally oriented ripples, respectively. The relative locations, ablation depths and the nanoripple distributions of the two patterns can be manipulated by adjusting the laser polarizations. Theoretical calculations of the interference patterns indicate clearly that the micropatterns are determined by the interferential intensity patterns, while the nanopatterns depend on the interferential polarization patterns. The micro/nanopatterns have potential applications in micro-optical polarization diffraction elements by virtue of femtosecond-laser-induced anisotropy.