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Magnetism induced by boron impurities in amorphous silicon

  • Y. Zhu*
  • , C. L. Du
  • , D. N. Shi
  • , K. C. Zhang
  • , C. L. Ma
  • , S. J. Gong
  • , Z. Q. Yang
  • *此作品的通讯作者
  • Nanjing University of Aeronautics and Astronautics
  • Bohai University
  • Suzhou University of Science and Technology
  • Fudan University

科研成果: 期刊稿件文章同行评审

摘要

With first-principles calculations, magnetism is found in amorphous silicon doped with B impurities. The maximum magnetic moment per impurity atom is predicted to be ∼1.0 B which originates mostly from unsaturated bond around three-fold coordinated Si atoms. Stoner criterion is employed to account for the magnetism induced by p-type impurities. The obtained spin polarized energies are around 50 meV, indicating that the magnetism found in amorphous silicon is able to survive even at room temperature.

源语言英语
文章编号073913
期刊Journal of Applied Physics
109
7
DOI
出版状态已出版 - 1 4月 2011

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