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Local leakage current behaviours of BiFeO3 films

  • Cheng Zou
  • , Bin Chen*
  • , Xiao Jian Zhu
  • , Zheng Hu Zuo
  • , Yi Wei Liu
  • , Yuan Fu Chen
  • , Qing Feng Zhan
  • , Run Wei Li
  • *此作品的通讯作者
  • University of Electronic Science and Technology of China
  • CAS - Ningbo Institute of Material Technology and Engineering

科研成果: 期刊稿件文章同行评审

摘要

The leakage current behaviours of polycrystalline BiFeO3 thin films are investigated by using both conductive atomic force microscopy and current-voltage characteristic measurements. The local charge transport pathways are found to be located mainly at the grain boundaries of the films. The leakage current density can be tuned by changing the post-annealing temperature, the annealing time, the bias voltage and the light illumination, which can be used to improve the performances of the ferroelectric devices based on the BiFeO3 films. A possible leakage mechanism is proposed to interpret the charge transports in the polycrystalline BiFeO3 films.

源语言英语
期刊论文编号117701
期刊Chinese Physics B
20
11
DOI
出版状态已出版 - 11月 2011
已对外发布

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