Lithium Niobate Photonic Integrated Circuits

In this work, we introduce photolithographyassisted chemo-mechanical etching (PLACE) as a novel approach for scalable fabrication of high-quality thin film lithium niobate (TFLN) photonic circuits. We demonstrate a range of integrated components and systems, including ultralow-loss delay lines, integrated photonic neural networks, electro-optically tunable lasers, and high-gain waveguide amplifiers. These devices exhibit state-of-the-art performance across key metrics such as modulation bandwidth, power efficiency, insertion loss, and functional versatility.