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Investigation of total ionizing dose effects in 4H–SiC power MOSFET under gamma ray radiation

  • Yabin Sun
  • , Xin Wan
  • , Ziyu Liu*
  • , Hu Jin
  • , Junzheng Yan
  • , Xiaojin Li
  • , Yanling Shi
  • *此作品的通讯作者
  • Fudan University
  • Aurorachip Co. Ltd
  • Tsinghua University
  • Ltd (state-owned Eight Nine One Factory)
  • East China Normal University

科研成果: 期刊稿件文章同行评审

摘要

In this work, the gamma ray radiation-induced total ionizing dose (TID) effects in SiC power MOSFETs are investigated. The transistor characteristics, such as transfer curve, output curve, drain-source ON-state resistance and terminal capacitance, are characterized to quantify the radiation tolerance. The threshold voltage is found to be sensitive to radiation and decreases with radiation dose increasing. An increased drive current and decreased drain-source ON-state resistance are resulted due to the decreased threshold voltage. The increased gate input capacitance exists after radiation. Verified in Sentaurus TCAD 2D simulation, the radiation-induced trap charge and interface states at SiO2/SiC interface are found to dominate the degradation of electrical behaviors in SiC power MOSFET.

源语言英语
文章编号110219
期刊Radiation Physics and Chemistry
197
DOI
出版状态已出版 - 8月 2022

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