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Investigation of Ni doped Ge-Te materials for high temperature phase change memory applications

  • Liang Liang Cao
  • , Liang Cai Wu*
  • , Zhi Tang Song
  • , Wen Qing Zhu
  • , Yong Hui Zheng
  • , Yan Cheng
  • , San Nian Song
  • , Zhong Yuan Ma
  • , Ling Xu
  • *此作品的通讯作者
  • CAS - Shanghai Institute of Microsystem and Information Technology
  • Shanghai University
  • Nanjing University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

Ni-doped Ge-Te (Ni-GT) material was proposed and investigated for phase change random access memory (PCRAM) applications. With Ni addition, the crystallization temperature, data retention ability and crystallization speed were obviously improved. The surface roughness of crystalline Ni-GT films was decreased by Ni incorporation. Moreover, temperature dependent transmission electron microscopy (TEM) was applied to investigate the phase change behavior of Ni-GT films. All the experimental results demonstrated that Ni-GT material has potential for high-speed PCRAM applications in high temperature environment.

源语言英语
主期刊名Functional and Functionally Structured Materials
编辑Yafang Han, Ying Wu, Guangxian Li, Fusheng Pan, Xuefeng Liu, Runhua Fan
出版商Trans Tech Publications Ltd
460-465
页数6
ISBN(印刷版)9783038357605
DOI
出版状态已出版 - 2016
已对外发布
活动Chinese Materials Congress on Functional and Functionally Structured Materials, CMC 2015 - Guiyang, 中国
期限: 10 7月 201514 7月 2015

出版系列

姓名Materials Science Forum
848
ISSN(印刷版)0255-5476
ISSN(电子版)1662-9752

会议

会议Chinese Materials Congress on Functional and Functionally Structured Materials, CMC 2015
国家/地区中国
Guiyang
时期10/07/1514/07/15

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