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Infrared spectroscopic ellipsometry study for narrow-band semiconductors

  • Shuang Guo
  • , Yunfeng Wang
  • , Gang Shi
  • , Jinzhong Zhang*
  • *此作品的通讯作者
  • Nanyang Institute of Technology

科研成果: 期刊稿件文献综述同行评审

摘要

Narrow-band semiconductors (0.1–2 eV band gap) are core materials for mid- and long-wave infrared optoelectronics. Infrared spectroscopic ellipsometry (IRSE) serves as a powerful non-destructive metrology tool to characterize their optical, electronic and structural properties. We summarize the principles, instrumentation, data analysis and typical applications of IRSE for narrow-band semiconductors. IRSE enables accurate extraction of band gap, carrier concentration, mobility, film thickness, interface roughness and strain, supporting band-gap engineering, carrier dynamics and heterostructure characterization. Recent advances in broadband light sources, Mueller-matrix detection, extreme-condition setups and machine learning greatly improve measurement capability and analytical efficiency. IRSE has been widely applied in mercury cadmium telluride (Hg1-xCdxTe), two-dimensional materials, quantum structures and phase-change semiconductors. Challenges including far-infrared noise, model generalization, and industrial translation are discussed, and future directions are prospected. This article provides a practical reference for IRSE-based characterization and device optimization of narrow-band semiconductors.

源语言英语
文章编号106717
期刊Infrared Physics and Technology
157
DOI
出版状态已出版 - 8月 2026

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