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In-Depth Atomic Mapping of Polarization Switching in a Ferroelectric Field-Effect Transistor

  • Xiaoyan Li
  • , Qiuxiang Zhu
  • , Lorenzo Vistoli
  • , Agnès Barthélémy
  • , Manuel Bibes
  • , Stéphane Fusil
  • , Vincent Garcia*
  • , Alexandre Gloter*
  • *此作品的通讯作者
  • Université Paris-Saclay
  • Universite Paris-Saclay

科研成果: 期刊稿件文章同行评审

摘要

The ferroelectric control of a Mott transistor is a promising strategy for nonvolatile low-power electronics. Understanding the fundamental limits of the ferroelectric-field effect is challenging, as the relevant length scales are restricted to a few atomic planes within the interface. Here, the polarization switching process of a prototypical ferroelectric Mott transistor combining BiFeO3, a ferroelectric material with a large polarization, and (Ca,Ce)MnO3, a charge-transfer insulator in which a few percent of Ce doping triggers a metal–insulator transition is investigated. While scanning probe microscopy indicates a complete switching of the ferroelectric gate, in-depth atomic-scale polarization mapping with scanning transmission electron microscopy reveals incomplete polarization reversal at the interface. Therefore, transport measurements show that the electronic properties of the Mott channel are virtually unchanged by the polarization direction. Nevertheless, in nanometer size areas where interfacial polarization switching occurs, dramatic changes of the electronic properties of (Ca,Ce)MnO3 are revealed. These results indicate how the performance of mesoscale Mott devices is hindered, and at the same time reveal the possibility of nanoscale energy-efficient Mott transistors.

源语言英语
文章编号2000601
期刊Advanced Materials Interfaces
7
14
DOI
出版状态已出版 - 1 7月 2020
已对外发布

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