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Holographic fabrication of hole arrays in AZO for study of surface plasmon resonances

  • David George*
  • , Safaa Hassan
  • , Murthada Adewole
  • , David Lowell
  • , Li Li
  • , Jun Ding
  • , Jingbiao Cui
  • , Hualiang Zhang
  • , Usha Philipose
  • , Yuankun Lin
  • *此作品的通讯作者
  • University of North Texas
  • University of Memphis
  • University of Massachusetts Lowell

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

Transparent conducting oxides are part of a robust material class that is capable of supporting near-IR surface plasmon resonances (SPRs) which are strongly dependent on size, structure, and doping of the material. This study presents the implementation of holographic lithography to structure large area square lattice cylindrical hole arrays on the transparent conducting oxide thin film, aluminum doped zinc oxide (AZO). For fabricated structures on a glass substrate, SPR are indirectly measured by FTIR transmission and verified with electromagnetic simulations using a finite difference time domain method. Furthermore, it is shown that the SPR excited are standing wave resonances in the (1,1) direction of the lattice array located at the interface of the patterned AZO and glass substrate. This research extends the robust CMOS compatible fabrication techniques of holographic lithography into tunable conductive materials,and contributes to the core technology of future integrated photonics.

源语言英语
主期刊名Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017
编辑Winston V. Schoenfeld, Georg von Freymann, Raymond C. Rumpf
出版商SPIE
ISBN(电子版)9781510606715
DOI
出版状态已出版 - 2017
已对外发布
活动Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017 - San Francisco, 美国
期限: 29 1月 20171 2月 2017

出版系列

姓名Proceedings of SPIE - The International Society for Optical Engineering
10115
ISSN(印刷版)0277-786X
ISSN(电子版)1996-756X

会议

会议Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017
国家/地区美国
San Francisco
时期29/01/171/02/17

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