摘要
Phototransistors based on two dimensional semiconductors have drawn increasing attention in recent years. GaSe is a typical semiconductor with a layered structure. In this work, the ultrathin GaSe nanosheets were exfoliated from commercially available crystals using a micromechanical cleavage technique. Then, the nanosheets were used to fabricate field effect transistors (FETs) on Si/SiO2 substrates with interdigitated electrodes. The electrical and optoelectronic properties of the FET were characterized. The phototransistor based on a GaSe nanosheet had a high photoresponsivity (∼2200 mA/W) and a high Iphoto/Idark (photoresponse current over dark current) ratio of almost 103.
| 源语言 | 英语 |
|---|---|
| 文章编号 | 143112 |
| 期刊 | Applied Physics Letters |
| 卷 | 107 |
| 期 | 14 |
| DOI | |
| 出版状态 | 已出版 - 5 10月 2015 |
| 已对外发布 | 是 |
学术指纹
探究 'Highly sensitive phototransistor based on GaSe nanosheets' 的科研主题。它们共同构成独一无二的学术指纹。引用此
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