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Highly sensitive phototransistor based on GaSe nanosheets

  • Hai Huang
  • , Peng Wang
  • , Yanqing Gao
  • , Xudong Wang
  • , Tie Lin*
  • , Jianlu Wang
  • , Lei Liao
  • , Jinglan Sun
  • , Xiangjian Meng
  • , Zhiming Huang
  • , Xiaoshuang Chen
  • , Junhao Chu
  • *此作品的通讯作者
  • CAS - Shanghai Institute of Technical Physics
  • University of Chinese Academy of Sciences
  • Wuhan University

科研成果: 期刊稿件文章同行评审

摘要

Phototransistors based on two dimensional semiconductors have drawn increasing attention in recent years. GaSe is a typical semiconductor with a layered structure. In this work, the ultrathin GaSe nanosheets were exfoliated from commercially available crystals using a micromechanical cleavage technique. Then, the nanosheets were used to fabricate field effect transistors (FETs) on Si/SiO2 substrates with interdigitated electrodes. The electrical and optoelectronic properties of the FET were characterized. The phototransistor based on a GaSe nanosheet had a high photoresponsivity (∼2200 mA/W) and a high Iphoto/Idark (photoresponse current over dark current) ratio of almost 103.

源语言英语
文章编号143112
期刊Applied Physics Letters
107
14
DOI
出版状态已出版 - 5 10月 2015
已对外发布

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