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Highly (222)-oriented pyrochlore PZN-PT thin films prepared by pulsed laser deposition

  • H. L. Han
  • , A. Y. Liu*
  • , L. L. Wei
  • , P. Wang
  • , F. T. Lin
  • , W. Z. Shi
  • , C. B. Jing
  • *此作品的通讯作者
  • Shanghai Normal University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

Highly (222)-oriented 90%Pb(Zn1/3Nb2/3)O 3-10%PbTiO3(abbreviated PZN-PT) thin films, about 550nm in thickness, have been successfully grown on (111)Pt/Ti/SiO2/Si substrate by pulsed laser deposition method. Pure pyrochlore phase with highly (222)-preferred orientation, determined by X-ray diffraction, was formed in the PZN-PT thin films when the temperature of substrates is 550 °C. FE-SEM investigation shows that the surface appearance and the cross section of the films are smooth and crack-free with some dispersive spherical protrusions. The dielectric constant and loss of the thin films were measured using an impedance analyzer (HP4194A). The dielectric constant (εr) and the dissipation factor (tanδ) at 1 kHz are 205 and 0.03, respectively.

源语言英语
主期刊名Eighth International Conference on Thin Film Physics and Applications
DOI
出版状态已出版 - 2013
活动8th International Conference on Thin Film Physics and Applications, TFPA 2013 - Shanghai, 中国
期限: 20 9月 201323 9月 2013

出版系列

姓名Proceedings of SPIE - The International Society for Optical Engineering
9068
ISSN(印刷版)0277-786X
ISSN(电子版)1996-756X

会议

会议8th International Conference on Thin Film Physics and Applications, TFPA 2013
国家/地区中国
Shanghai
时期20/09/1323/09/13

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