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High resolution and hybrid patterning for single cell attachment

  • J. Hu
  • , J. Shi
  • , F. Zhang
  • , L. Lei
  • , X. Li
  • , L. Wang
  • , L. Liu
  • , Y. Chen*
  • *此作品的通讯作者
  • CNRS-ENS-UPMC UMR 8640
  • Kyoto University

科研成果: 期刊稿件文章同行评审

摘要

We present a method to fabricate topographical and chemical patterns for cell attachment studies. Soft UV nanoimprint lithography, photolithography and reactive ion etch techniques are combined to produce high resolution line-and-space grating arrays on a quartz plate. Then, micro-contact printing is used to add protein patterns on the topographic features to promote cell adhesion on selected areas. We found that the hybrid patterns with a dimension comparable to the size of cells have pronounced effects on the cell adhesion and its morphological changes.

源语言英语
页(从-至)726-729
页数4
期刊Microelectronic Engineering
87
5-8
DOI
出版状态已出版 - 2010
已对外发布

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