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HfO2-ZrO2 Superlattice Ferroelectric Capacitor With Improved Endurance Performance and Higher Fatigue Recovery Capability

  • Yue Peng
  • , Wenwu Xiao
  • , Yan Liu*
  • , Chengji Jin
  • , Xinran Deng
  • , Yueyuan Zhang
  • , Fenning Liu
  • , Yunzhe Zheng
  • , Yan Cheng
  • , Bing Chen
  • , Xiao Yu
  • , Yue Hao
  • , Genquan Han
  • *此作品的通讯作者
  • School of Microelectronics, Xidian University
  • Xi’an UniIC Semiconductors
  • Zhejiang Lab
  • East China Normal University
  • Zhejiang University
  • Hangzhou Institute of Technology

科研成果: 期刊稿件文章同行评审

摘要

HfO2-ZrO2 superlattice (SL) ferroelectric (FE) capacitor is demonstrated to have improved endurance performance and higher fatigue recovery capability compared to the HfZrO<italic>x</italic> (HZO) device. During the cycling of polarization (<inline-formula> <tex-math notation="LaTeX">{P} </tex-math></inline-formula>) <italic>vs.</italic> voltage (<inline-formula> <tex-math notation="LaTeX">{V} </tex-math></inline-formula>) loops, the SL metal-FE-metal (MFM) capacitor exhibits the higher <inline-formula> <tex-math notation="LaTeX">{P} </tex-math></inline-formula> and the lower leakage current over the HZO device indicating the lower defect density in SL. The SL capacitor achieves an endurance of <inline-formula> <tex-math notation="LaTeX">{5}times {10} {{12}} </tex-math></inline-formula> cycles, which is three orders of magnitude higher than the HZO device. The <inline-formula> <tex-math notation="LaTeX">{P} </tex-math></inline-formula> fatigue of the SL capacitor can be fully recovered through a ~30 s break, and that of HZO is only partially recovered utilizing the higher field cycling. This is because the trapping/detrapping process significantly decreases in HfO2-ZrO2 SL over HZO capacitor by the reduced defect density. These results prove that the HfO2-ZrO2 SL is a promising technology for endurance unlimited FE random access memory.

源语言英语
页(从-至)216-219
页数4
期刊IEEE Electron Device Letters
43
2
DOI
出版状态已出版 - 1 2月 2022

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