跳到主要导航 跳到搜索 跳到主要内容

Growth and ferroelectric properties of strontium bismuth tantalite thin films using pulsed laser deposition combined with an annealing process

  • Pingxiong Yang*
  • , Ningsheng Zhou
  • , Lirong Zheng
  • , Huaixian Lu
  • , Chenglu Lin
  • *此作品的通讯作者
  • CAS - Shanghai Institute of Microsystem and Information Technology
  • Nanjing University

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

Ferroelectric strontium bismuth tantalite (SBT) thin films were fabricated on Pt/Ti/SiO2/Si substrates using pulsed laser deposition combined with an annealing process. The crystallization and ferroelectric properties were clearly dependent on the annealing conditions. SBT thin films with good crystallization and ferroelectric properties were obtained after annealing at 700°C for 90 min. The films showed high (115) and (008) diffraction peaks. Good ferroelectric properties were obtained from the films; remnant polarization and coercive field were about 10 μm C cm-2 and 57 kV cm-1, respectively. No fatigue was observed up to 1010 switching cycles. The dc leakage current was about 4 × 10-8 A cm-2 and the dc breakdown field was 250 kV cm-1.

源语言英语
页(从-至)527-532
页数6
期刊Journal of Physics D: Applied Physics
卷30
期4
DOI
出版状态已出版 - 21 2月 1997
已对外发布是

学术指纹

探究 'Growth and ferroelectric properties of strontium bismuth tantalite thin films using pulsed laser deposition combined with an annealing process' 的科研主题。它们共同构成独一无二的学术指纹。

引用此