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Gas-Phase Preparation of Silyl Cyanide (SiH3CN) via a Radical Substitution Mechanism

  • Zhenghai Yang
  • , Chao He
  • , Shane J. Goettl
  • , Dababrata Paul
  • , Ralf I. Kaiser*
  • , Mateus X. Silva
  • , Breno R.L. Galvaõ*
  • *此作品的通讯作者
  • University of Hawai'i at Mānoa
  • Centro Federal de Educação Tecnológica de Minas Gerais

科研成果: 期刊稿件文章同行评审

摘要

The silyl cyanide (SiH3CN) molecule, the simplest representative of a fully saturated silacyanide, was prepared in the gas phase under single-collision conditions via a radical substitution mechanism. The chemical dynamics were direct and revealed a pronounced backward scattering as a consequence of a transition state with a pentacoordinated silicon atom and almost colinear geometry of the attacking cyano radical and leaving hydrogen. Compared to the isovalent cyano (CN)−methane (CH4) system, the CN−SiH4 system dramatically reduces the energy of the transition state to silyl cyanide by nearly 100 kJ mol−1, which reveals a profound effect on the chemical bonding and reaction mechanism. In extreme high-temperature environments including circumstellar envelopes of IRC +10216, this versatile radical substitution mechanism may synthesize organosilicon molecules via reactions of silane with doublet radicals. Overall, this study provides rare insights into the exotic reaction mechanisms of main-group XIV elements in extreme environments and affords deeper insights into fundamental molecular mass growth processes involving silicon in our universe.

源语言英语
页(从-至)8649-8657
页数9
期刊Journal of the American Chemical Society
144
19
DOI
出版状态已出版 - 18 5月 2022
已对外发布

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