TY - JOUR
T1 - Facing-target sputtering deposition of ZnO films with Pt ultra-thin layers for gas-phase photocatalytic application
AU - Zhang, Zhonghai
AU - Hossain, Md Faruk
AU - Arakawa, Takuya
AU - Takahashi, Takakazu
PY - 2010/4/15
Y1 - 2010/4/15
N2 - In this paper, various zinc oxide (ZnO) films are deposited by a versatile and effective dc-reactive facing-target sputtering method. The ratios of Ar to O2 in the mixture gas are varied from 8:2 to 6:4 at a fixed sputtering pressure of 1.0 Pa. X-ray diffraction, spectrophotometer and scanning electron microscope are used to study the crystal structure, optical property and surface morphology of the as-deposited films. The Pt ultra-thin layer, ∼2 nm thick, is deposited on the surface of ZnO film by dc diode sputtering with a mesh mask controlling the coated area. The photocatalytic activity of ZnO films and Pt-ZnO films is evaluated by decomposition of methanol under UV-vis light irradiation. The variation of photocatalytic activity depends on the ratios of Ar to O2, which is mainly attributed to the different grain size and carrier mobility. Though the pure ZnO film normally shows a low gas-phase photocatalytic activity, its activity is significantly enhanced by depositing Pt ultra-thin layer.
AB - In this paper, various zinc oxide (ZnO) films are deposited by a versatile and effective dc-reactive facing-target sputtering method. The ratios of Ar to O2 in the mixture gas are varied from 8:2 to 6:4 at a fixed sputtering pressure of 1.0 Pa. X-ray diffraction, spectrophotometer and scanning electron microscope are used to study the crystal structure, optical property and surface morphology of the as-deposited films. The Pt ultra-thin layer, ∼2 nm thick, is deposited on the surface of ZnO film by dc diode sputtering with a mesh mask controlling the coated area. The photocatalytic activity of ZnO films and Pt-ZnO films is evaluated by decomposition of methanol under UV-vis light irradiation. The variation of photocatalytic activity depends on the ratios of Ar to O2, which is mainly attributed to the different grain size and carrier mobility. Though the pure ZnO film normally shows a low gas-phase photocatalytic activity, its activity is significantly enhanced by depositing Pt ultra-thin layer.
KW - Facing-target sputtering
KW - Photocatalytic activity
KW - Pt ultra-thin layer
KW - ZnO
UR - https://www.scopus.com/pages/publications/74449088058
U2 - 10.1016/j.jhazmat.2009.11.136
DO - 10.1016/j.jhazmat.2009.11.136
M3 - 文章
C2 - 20007007
AN - SCOPUS:74449088058
SN - 0304-3894
VL - 176
SP - 973
EP - 978
JO - Journal of Hazardous Materials
JF - Journal of Hazardous Materials
IS - 1-3
ER -