Fabrication of ferroelectric PbZr_xTi_1-xO₃ thick films and their optical waveguide properties

The fabrication and characterization of the PbZr_xTi _1-xO₃ films with thickness of 3μm on LaNi₃ coated silicon substrates was carried out using sol-gel process. The x-ray diffraction analysis shows that both of the films exhibit highly (100) -preferred orientation and a single perovskite phase. More than 99% (100)- preferred orientation was achieved for the PZT film. Atomic foce microscopy measurement shows that the PZT samples possessed smooth surfaces and the low value of rms.