跳到主要导航 跳到搜索 跳到主要内容

Fabrication and optical property of two-dimensional infrared photonic crystals by deep reactive ion etching in Si

  • Mei Zhou*
  • , Xiao Shuang Chen
  • , Yong Zeng
  • , Jing Xu
  • , Shao Wei Wang
  • , Wei Lu
  • *此作品的通讯作者
  • CAS - Shanghai Institute of Technical Physics

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

We report the fabrication and characterization of two-dimensional silicon-based photonic crystal structures realized by deep reactive ion etching method. Photonic crystals of square and triangular lattices with very high aspect ratios up to 33 have been achieved. Photonic bandgap behaviors are identified by the transmission and reflection spectra measured by using a Fourier transform infrared spectrometer. The experiment results are in good agreement with calculated band structures.

源语言英语
主期刊名Conference Digest of the 2004 Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics
编辑M. Thumm, W. Wiesbeck
183-184
页数2
出版状态已出版 - 2004
已对外发布
活动Conference Digest of the 2004 Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics - Karlsruhe, 德国
期限: 27 9月 20041 10月 2004

出版系列

姓名Conference Digest of the 2004 Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics

会议

会议Conference Digest of the 2004 Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics
国家/地区德国
Karlsruhe
时期27/09/041/10/04

指纹

探究 'Fabrication and optical property of two-dimensional infrared photonic crystals by deep reactive ion etching in Si' 的科研主题。它们共同构成独一无二的指纹。

引用此