Evolution of microstructure and related properties of PbZr_0.4 Ti_0.6 O₃ films on F-doped tin oxide with annealing temperature

PbZr_0.4 Ti_0.6 O₃ films were fabricated on glass slices coated with a layer of F-doped transparent conductive tin oxide layer by chemical solution deposition. The evolution of microstructures and related properties of the PbZr_0.4 Ti_0.6 O₃ films with annealing temperature were studied. The films show a perovskite phase and a crack-free surface morphology. The films annealed at >550 °C display a distinguishable layered structure consisting of dense and porous PbZr0.4 Ti0.6 O₃ layers. The sample treated at 650 °C exhibits the largest average remanent polarization of 29.2 μC/ cm² and peak reflectivity of 95% among the films. 650 °C appears to be the best processing condition for the growth of PbZr_0.4 Ti_0.6 O₃ multilayers with excellent ferroelectric and optical properties on F-doped tin oxide thin films.