Ellipsometric characterization of LaNio3-x films grown on Si (111) substrates: Effects of oxygen partial pressure

Z. G. Hu; Z. M. Huang; Y. N. Wu; Q. Zhao; G. S. Wang; J. H. Chu

doi:10.1063/1.1686904

Ellipsometric characterization of LaNio_3-x films grown on Si (111) substrates: Effects of oxygen partial pressure

Z. G. Hu^*
, Z. M. Huang
, Y. N. Wu
, Q. Zhao
, G. S. Wang
, J. H. Chu

^*此作品的通讯作者

CAS - Shanghai Institute of Technical Physics

科研成果: 期刊稿件 › 文章 › 同行评审

17 引用（Scopus）

摘要

The optical properties of the LaNiO_3-x films were investigated using high-accuracy spectroscopic ellipsometry technique. The parameterized Drude and double Lorentzian oscillator dispersion relation was used to express the optical properties of the LaNiO_3-x films. It was found that refractive index decreases with increasing oxygen partial pressure in the measured wavelength region except for the film with 50% oxygen partial pressure. The large stoichiometric ratio Ni:La was induced to the small resistivity of the LaNiO_3-x films.

源语言	英语
页（从-至）	4036-4041
页数	6
期刊	Journal of Applied Physics
卷	95
期	8
DOI	https://doi.org/10.1063/1.1686904
出版状态	已出版 - 15 4月 2004
已对外发布	是

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abstract = "The optical properties of the LaNiO3-x films were investigated using high-accuracy spectroscopic ellipsometry technique. The parameterized Drude and double Lorentzian oscillator dispersion relation was used to express the optical properties of the LaNiO3-x films. It was found that refractive index decreases with increasing oxygen partial pressure in the measured wavelength region except for the film with 50\% oxygen partial pressure. The large stoichiometric ratio Ni:La was induced to the small resistivity of the LaNiO3-x films.",

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T2 - Effects of oxygen partial pressure

AU - Hu, Z. G.

AU - Huang, Z. M.

AU - Wu, Y. N.

AU - Zhao, Q.

AU - Wang, G. S.

AU - Chu, J. H.

PY - 2004/4/15

Y1 - 2004/4/15

N2 - The optical properties of the LaNiO3-x films were investigated using high-accuracy spectroscopic ellipsometry technique. The parameterized Drude and double Lorentzian oscillator dispersion relation was used to express the optical properties of the LaNiO3-x films. It was found that refractive index decreases with increasing oxygen partial pressure in the measured wavelength region except for the film with 50% oxygen partial pressure. The large stoichiometric ratio Ni:La was induced to the small resistivity of the LaNiO3-x films.

AB - The optical properties of the LaNiO3-x films were investigated using high-accuracy spectroscopic ellipsometry technique. The parameterized Drude and double Lorentzian oscillator dispersion relation was used to express the optical properties of the LaNiO3-x films. It was found that refractive index decreases with increasing oxygen partial pressure in the measured wavelength region except for the film with 50% oxygen partial pressure. The large stoichiometric ratio Ni:La was induced to the small resistivity of the LaNiO3-x films.

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JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 8

ER -

Ellipsometric characterization of LaNio3-x films grown on Si (111) substrates: Effects of oxygen partial pressure

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Ellipsometric characterization of LaNio_3-x films grown on Si (111) substrates: Effects of oxygen partial pressure