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Effect of substitution of vanadium on the structure and electrical properties of Bi3.25La0.75Ti3O12 thin films

  • X. J. Meng*
  • , J. H. Ma
  • , J. L. Sun
  • , T. Lin
  • , J. Yu
  • , G. S. Wang
  • , J. H. Chu
  • *此作品的通讯作者
  • CAS - Shanghai Institute of Technical Physics

科研成果: 期刊稿件文章同行评审

摘要

The ferroelectric and dielectric properties of Bi4-xLa xTi3O12 (BLT) and B4-xLa xTi2.97O12 (BLTV) thin films deposited on (111)Pt/Ti/SiO2/Si substrates using a chemical solution method were investigated. The BLTV thin films showed a larger remanent polarization (9.6 μC/cm2) than the BLT thin films (6.5 μC/cm2), while the coercive field for both thin films was nearly the same. The capacitance of the films as a function of a small ac driving field was measured, and the data were processed using Rayleigh's law. The results show that the Rayleigh constant of the BLT films was smaller than that of the BLTV films, indicating that the defect concentration was lower in the latter case. The superior ferroelectricity of the BLTV films was attributed to a decrease of both the (001) orientation and the defect concentration.

源语言英语
页(从-至)1089-1091
页数3
期刊Applied Physics A: Materials Science and Processing
78
7
DOI
出版状态已出版 - 4月 2004
已对外发布

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