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Crystallization behavior of Ge2Te3-TiO2 film for phase-change random access memory application

  • Yegang Lu*
  • , Sannian Song
  • , Zhitang Song
  • , Yan Cheng
  • , Liangcai Wu
  • , Bo Liu
  • *此作品的通讯作者
  • CAS - Shanghai Institute of Microsystem and Information Technology
  • University of Chinese Academy of Sciences
  • CAS - Shanghai Institute of Technical Physics

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

Crystallization behavior of the Ge2Te3-TiO 2 films prepared by the co-sputtering using Ge2Te 3 and TiO2 targets was investigated by in situ resistance-temperature measurement and transmission electron microscopy. The crystallization kinetic parameters including rate factor and kinetics exponent were obtained by the non-isothermal change in resistance using Kissinger's plot and Ozawa's method. The average kinetics exponent was estimated by the nonisothermal change in resistance. Compared with other studied compositions, the composition with TiO2 concentration of 5 at.% exhibited shorter crystallization time which was calculated by the Johnson-Mehl-Avrami equation. The crystallization behavior of Ge2Te3-TiO2 film was verified by the transition electron microscopy at different annealing temperature. With the short crystallization time and high crystallization temperature, the compositions with TiO2 concentration of 5-15 at.% may be one of the competing candidates for phase change memory application.

源语言英语
主期刊名2012 International Workshop on Information Storage and Ninth International Symposium on Optical Storage
DOI
出版状态已出版 - 2013
已对外发布
活动2012 International Workshop on Information Storage, IWIS 2012 and 9th International Symposium on Optical Storage, ISOS 2012 - Shanghai, 中国
期限: 21 10月 201224 10月 2012

出版系列

姓名Proceedings of SPIE - The International Society for Optical Engineering
8782
ISSN(印刷版)0277-786X
ISSN(电子版)1996-756X

会议

会议2012 International Workshop on Information Storage, IWIS 2012 and 9th International Symposium on Optical Storage, ISOS 2012
国家/地区中国
Shanghai
时期21/10/1224/10/12

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