摘要
We report the fabrication of an 8-meter-long thin-film lithium niobate optical true delay line using the photolithography-assisted chemomechanical etching technique, showing a low transmission loss of 0.036 dB/cm in the conventional telecom band.
| 源语言 | 英语 |
|---|---|
| 期刊论文编号 | 070401 |
| 期刊 | Chinese Physics Letters |
| 卷 | 42 |
| 期 | 7 |
| DOI | |
| 出版状态 | 已出版 - 1 7月 2025 |
学术指纹
探究 'Compact Ultra-Low Loss Optical True Delay Line on Thin Film Lithium Niobate' 的科研主题。它们共同构成独一无二的学术指纹。引用此
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver