摘要
Radiation effects of 20 MeV Br on bipolar transistors are investigated in this work. A distinct different bias dependences are found for damage factors (DF) of forward and reverse current gain. For reverse current gain, DF gradually decreases with the voltage across base-collector junction (VBC) increasing, until a saturated value is reached. While an unexpected increase exists in DF of forward current gain over the high voltage across base-collector junction (VBE) region. The high injection effect is found to contribute to the observed rebound for forward current gain over high VBE region. From the device physical perspective, a physics-based analytical closed DF model for forward and reverse current gain is proposed, including the contribution of high injection effect and recombination current in junction space charge region. A good agreement is obtained between the measured and modeled data over the whole bias region.
| 源语言 | 英语 |
|---|---|
| 文章编号 | 105336 |
| 期刊 | Materials Science in Semiconductor Processing |
| 卷 | 121 |
| DOI | |
| 出版状态 | 已出版 - 1月 2021 |
指纹
探究 'Characterizing and modeling current gain degradation in bipolar transistor exposed to heavy ion radiation' 的科研主题。它们共同构成独一无二的指纹。引用此
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver