摘要
We report the characterization of FeSix (x∼3) thin film prepared by simultaneous electron beam evaporation of Fe and Si onto a β-FeSi2 template at 250°C. The in situ reflective high energy electron diffraction observation and ex situ cross-section transmission electron microscope characterization of the as-deposited film imply that the as-deposited film has the structure similar to that of β-FeSi2. But the spreading resistance measurement shows that the film is metallic. Auger electron spectroscopy suggests that the chemical environment of Fe atoms in the as-deposited FeSix film is different from that in the annealed film (β-FeSi2 film). We explain this paradox by assuming that the as-deposited film has the crystal lattice similar to β-FeSi2 but with ingredient disorder due to the low transport viscosity of Fe and Si atoms at this temperature.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 2858-2860 |
| 页数 | 3 |
| 期刊 | Applied Physics Letters |
| 卷 | 68 |
| 期 | 20 |
| DOI | |
| 出版状态 | 已出版 - 1996 |
| 已对外发布 | 是 |
指纹
探究 'Characterization of FeSix film by codeposition on β-FeSi2 template' 的科研主题。它们共同构成独一无二的指纹。引用此
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