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Characterization of Cu doping on GeTe for phase change memory application

  • Zhonghua Zhang
  • , Cheng Peng
  • , Sannian Song
  • , Zhitang Song
  • , Yan Cheng
  • , Kun Ren
  • , Xiaoyun Li
  • , Feng Rao
  • , Bo Liu
  • , Songlin Feng
  • CAS - Shanghai Institute of Microsystem and Information Technology
  • University of Chinese Academy of Sciences

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

In this paper, Cu-doped GeTe materials have been investigated for higherature phase change memory (PCM) application. Cu incorporated in GeTe increases the crystallization temperature, crystallization active energy, and band gap significantly. The incorporated Cu has effect on refining the crystal growth and brings more number of bonds in GeTe, and has remarkable effect on improving the thermal stability of GeTe. The 10-year data retention of Cu 0.06(GeTe)0.94 and Cu0.13(GeTe)0.87 are 151 °C and 185 °C, which is higher than that of GeTe. PCM device based on Cu0.06(GeTe)0.94 exhibits faster switching speed than that of GeTe. In addition, Cu0.06(GeTe)0.94 shows endurance up to 2.8 × 103 cycles with an on/off ratio of two orders of magnitude.

源语言英语
期刊论文编号244311
期刊Journal of Applied Physics
卷114
期24
DOI
出版状态已出版 - 28 12月 2013
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