Bias-dependent photoresponse of Td-WTe2 grown by chemical vapor deposition

Yupeng Cao; Aiping Cao; Shubing Li; Jianli Tang; Rui Hu; Liyan Shang; Yawei Li; Kai Jiang; Jinzhong Zhang; Liangqing Zhu; Zhigao Hu

doi:10.1088/1361-6528/ad5dbf

Bias-dependent photoresponse of T_d-WTe₂ grown by chemical vapor deposition

Yupeng Cao
, Aiping Cao
, Shubing Li
, Jianli Tang
, Rui Hu
, Liyan Shang^*
, Yawei Li^*
, Kai Jiang
, Jinzhong Zhang
, Liangqing Zhu
, Zhigao Hu

^*此作品的通讯作者

科研成果: 期刊稿件 › 文章 › 同行评审

1 引用（Scopus）

摘要

The type-II Weyl semimetal T_d-WTe₂ is one of the wonder materials for high-performance optoelectronic devices. We report the self-powered T_d-WTe₂ photodetectors and their bias-dependent photoresponse in the visible region (405, 520, 638 nm) driven by the bulk photovoltaic effect. The device shows the responsivity of 15.8 mAW⁻¹ and detectivity of 5.2 × 10⁹ Jones at 520 nm. Besides, the response time of the WTe₂ photodetector shows the strong bias-voltage dependent property. This work offers a physical reference for understanding the photoresponse process of T_d-WTe₂ photodetectors.

源语言	英语
文章编号	395201
期刊	Nanotechnology
卷	35
期	39
DOI	https://doi.org/10.1088/1361-6528/ad5dbf
出版状态	已出版 - 23 9月 2024
已对外发布	是

联合国可持续发展目标

此成果有助于实现下列可持续发展目标：

可持续发展目标 7 经济适用的清洁能源

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10.1088/1361-6528/ad5dbf

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引用此

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title = "Bias-dependent photoresponse of Td-WTe2 grown by chemical vapor deposition",

abstract = "The type-II Weyl semimetal Td-WTe2 is one of the wonder materials for high-performance optoelectronic devices. We report the self-powered Td-WTe2 photodetectors and their bias-dependent photoresponse in the visible region (405, 520, 638 nm) driven by the bulk photovoltaic effect. The device shows the responsivity of 15.8 mAW−1 and detectivity of 5.2 × 109 Jones at 520 nm. Besides, the response time of the WTe2 photodetector shows the strong bias-voltage dependent property. This work offers a physical reference for understanding the photoresponse process of Td-WTe2 photodetectors.",

keywords = "T-WTe, bias-dependent, chemical vapor deposition, photodetector, self-power",

author = "Yupeng Cao and Aiping Cao and Shubing Li and Jianli Tang and Rui Hu and Liyan Shang and Yawei Li and Kai Jiang and Jinzhong Zhang and Liangqing Zhu and Zhigao Hu",

note = "Publisher Copyright: {\textcopyright} 2024 IOP Publishing Ltd.",

year = "2024",

month = sep,

day = "23",

doi = "10.1088/1361-6528/ad5dbf",

language = "英语",

volume = "35",

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TY - JOUR

T1 - Bias-dependent photoresponse of Td-WTe2 grown by chemical vapor deposition

AU - Cao, Yupeng

AU - Cao, Aiping

AU - Li, Shubing

AU - Tang, Jianli

AU - Hu, Rui

AU - Shang, Liyan

AU - Li, Yawei

AU - Jiang, Kai

AU - Zhang, Jinzhong

AU - Zhu, Liangqing

AU - Hu, Zhigao

PY - 2024/9/23

Y1 - 2024/9/23

N2 - The type-II Weyl semimetal Td-WTe2 is one of the wonder materials for high-performance optoelectronic devices. We report the self-powered Td-WTe2 photodetectors and their bias-dependent photoresponse in the visible region (405, 520, 638 nm) driven by the bulk photovoltaic effect. The device shows the responsivity of 15.8 mAW−1 and detectivity of 5.2 × 109 Jones at 520 nm. Besides, the response time of the WTe2 photodetector shows the strong bias-voltage dependent property. This work offers a physical reference for understanding the photoresponse process of Td-WTe2 photodetectors.

AB - The type-II Weyl semimetal Td-WTe2 is one of the wonder materials for high-performance optoelectronic devices. We report the self-powered Td-WTe2 photodetectors and their bias-dependent photoresponse in the visible region (405, 520, 638 nm) driven by the bulk photovoltaic effect. The device shows the responsivity of 15.8 mAW−1 and detectivity of 5.2 × 109 Jones at 520 nm. Besides, the response time of the WTe2 photodetector shows the strong bias-voltage dependent property. This work offers a physical reference for understanding the photoresponse process of Td-WTe2 photodetectors.

KW - T-WTe

KW - bias-dependent

KW - chemical vapor deposition

KW - photodetector

KW - self-power

UR - https://www.scopus.com/pages/publications/85198649029

U2 - 10.1088/1361-6528/ad5dbf

DO - 10.1088/1361-6528/ad5dbf

M3 - 文章

C2 - 38955161

AN - SCOPUS:85198649029

SN - 0957-4484

VL - 35

JO - Nanotechnology

JF - Nanotechnology

IS - 39

M1 - 395201

ER -

Bias-dependent photoresponse of Td-WTe2 grown by chemical vapor deposition

摘要

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引用此

Bias-dependent photoresponse of T_d-WTe₂ grown by chemical vapor deposition