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Annealing process and mechanism of glass based VO2 film from V oxidation in pure oxygen atmosphere

  • Xingxing Liu
  • , Ruonan Ji
  • , Yi Zhang
  • , Huafen Li
  • , Shao Wei Wang*
  • *此作品的通讯作者
  • CAS - Shanghai Institute of Technical Physics
  • Shanghai Engineering Research Center of Energy-Saving Coatings
  • University of Chinese Academy of Sciences
  • Shanghai Normal University

科研成果: 期刊稿件文章同行评审

摘要

Vanadium oxidation method is a promising approach for industrial production of VO2 thin film on glass. For this method, post-annealing process is vital to the formation and quality of VO2 thin film. Annealing temperature, time, and oxygen pressure for preparing of large scale VO2 films on glass were studied systematically in this work. The influence of V film thickness is studied as well. The results reveal that the best annealing parameters are significantly influenced by the thickness of V film. The mechanism of annealing oxidation process is discussed further. The oxidation process is dominated by the reaction-control rather than the diffusion-control. A 200 mm × 200 mm large area VO2 film on glass substrate was successfully prepared through metal vanadium oxidation method for demonstration. It is a promising way for large scale fabrication of high performance smart energy-saving window.

源语言英语
文章编号453
期刊Optical and Quantum Electronics
48
10
DOI
出版状态已出版 - 1 10月 2016
已对外发布

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